Structure and nanomechanical properties of Al1−xScxN thin films

In this study, c-axis oriented AlN and Al1−xScxN films have been successfully grown on Si (100) and quartz glass by DC magnetron reactive sputtering method. The crystalline structure, optical properties and nanomechanical properties of AlN thin films are investigated by X-ray diffraction (XRD), Raman spectroscopy and nanoindentation techniques, respectively. The XRD patterns show that the crystal structure of the Al1−xScxN films was (002) orientation. The frequency of the E2 (high) mode observed in the Al1−xScxN films shows higher red shift compared to that observed in AlN film. The nanoindentation hardness and elastic results of Al1−xScxN films were 16 GPa and 190 GPa compared to that of 11.2 GPa and 110.4 GPa for AlN film.