Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M
2007
To realize good repeatability in CD measurements, many issues have to be addressed including system stability, sample
charging and contamination, measurement conditions, and image processing. The S-9380M is a mask CD-SEM (Critical
Dimension Scanning Electron Microscope) system developed for measurement and inspection of 45 nm node photomask.
The S-9380M has several innovations like a newly designed optical system to minimize sample charge-up and drift
effects, ultra-high resolution (3nm) imaging to enable measurements at high magnification, and an integrated ultra-violet
(UV) unit for pre-treatment of the mask to rid the surface of organic contaminants. This paper presents measurements
carried out using the S-9380M system, and showed that superior performance is achieved with short-term dynamic
repeatability of 3σ less than 0.6 nm (for line patterns), and long-term dynamic repeatability of 3σ less than 1.0 nm
without trend modification.
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