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Patterning Characteristics of 0.1-μm Line-and-Space Patternin Synchrotron Radiation Lithography
Patterning Characteristics of 0.1-μm Line-and-Space Patternin Synchrotron Radiation Lithography
1994
Yoh Somemura
Kimiyoshi Deguchi
Kazunori Miyoshi
Keywords:
X-ray lithography
Fresnel diffraction
Synchrotron radiation
Photolithography
Maskless lithography
Next-generation lithography
Lithography
Optics
Materials science
Extreme ultraviolet lithography
Correction
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