The REBL DPG: recent innovations and remaining challenges
2014
Reflective electron-beam lithography (REBL) employs a novel device to impress pattern information on an electron
beam. This device, the digital pattern generator (DPG), is an array of small electron reflectors, in which the reflectance
of each mirror is controlled by underlying CMOS circuitry. When illuminated by a beam of low-energy electrons, the
DPG is effectively a programmable electron-luminous image source. By switching the mirror drive circuits
appropriately, the DPG can ‘scroll’ the image of an integrated circuit pattern across its surface; and the moving electron
image, suitably demagnified, can be used to expose the resist-coated surface of a wafer or mask. This concept was first
realized in a device suitable for 45 nm lithography demonstrations. A next-generation device has been designed and is
presently nearing completion. The new version includes several advances intended to make it more suitable for
application in commercial lithography systems. We will discuss the innovations and compromises in the design of this
next-generation device. For application in commercially-practical maskless lithography at upcoming device nodes, still
more advances will be needed. Some of the directions in which this technology can be extended will be described.
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