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A Fully Planarized 0.25 /spl mu/m CMOS Technology
A Fully Planarized 0.25 /spl mu/m CMOS Technology
1991
D.S. Wen
W.H. Chang
Y. Lii
A.C. Megdanis
P. McFarland
Gary B. Bronner
Keywords:
Electronic engineering
Engineering
Electrical engineering
CMOS
Chemical-mechanical planarization
Capacitance
Rapid thermal processing
Silicon
Etching
Correction
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