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Ta‐O‐N Thin Films Deposited by Low Vacuum Reactive Sputtering
Ta‐O‐N Thin Films Deposited by Low Vacuum Reactive Sputtering
2014
Takashi Hashizume
Atsushi Saiki
Kiyoshi Terayama
Keywords:
Sputtering
Thin film
Carbon film
Materials science
Inorganic chemistry
Microelectronics
Optoelectronics
low vacuum
Correction
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