Improvement of the Crystalline Quality of β-Ga2O3 Films by High-Temperature Annealing

For the purpose of improving the crystalline quality of undoped and Si doped β-Ga2O3 films, high temperature annealing at 900°C was performed. The crystalline quality of the films investigated using scanning electron microscopy and X-ray diffraction. Also the conductivity of the films is compared before and after the annealing. After the 900°C annealing, the XRD peaks intensity corresponding to β-Ga2O3 is increased. This result indicates that the crystalline quality improves by the high temperature annealing.