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Tantalum Films Deposited by Asymmetric A‐C Sputtering
Tantalum Films Deposited by Asymmetric A‐C Sputtering
1965
F. Vratny
D. J. Harrington
Keywords:
Oxygen
Sputtering
Nitrogen
Impurity
Tantalum
Noble gas
Inorganic chemistry
Argon
Chemistry
Electric potential
Fabrication
Correction
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