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A Manufacturable Embedded Fluorinated Si02 for Advanced 0.25 ym CMOS VLSl Multilevel Interconnect Applications.
A Manufacturable Embedded Fluorinated Si02 for Advanced 0.25 ym CMOS VLSl Multilevel Interconnect Applications.
1998
C.S. Pai
A.N. Velaga
W.S. Lindenberger
K.P. Cheung
Frieder H. Baumann
C. P. Chang
C.T. Liu
R. Liu
Philip W. Diodato
J.I. Colonell
H. Vaidya
S. C. Vitkavage
J. T. Clemens
F. Tsubokura
Keywords:
Interconnection
Electronic engineering
Computer science
CMOS
Correction
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