CALCULATION OF THE OPTICAL INDICES AND OPTICAL ABSORPTION OF THE MANGANESE ON THE IR-VIS-UV DOMAIN

Thin film materials have received a great deal of interest by research workers. New elaboration techniques of these materials have been developed as a result of the increasing potential applications in many fields, particularly in optics. Theoretical thin layer investigations were reported by many researchers. These calculations consist usually of determining materials optic features, such as refraction (n) and extinction (k) indices, which can be considered as the response of the material after its excitation by electromagnetic radiation. In this work, calculations of both (n) and (k) are carried out taking account the measurement of an energy range spreading from 0.48 eV to 0.62 eV, and the film thickness (d). Our investigation, concerns thin absorbent layers deposited on a transparent silica substrate of parallel faces. Under these conditions we consider multiple reflections in the substrate (supposed as a semi-infinite environment), then solve a system of two non-linear equations by applying Newton-Raphson's method. The algorithm thus elaborated is applied to a 395 A° thick manganese film prepared by sputtering. The obtained results are in good agreement with published data.