Properties of niobium oxide films deposited by pulsed DC reactive magnetron sputtering

thin films at various cathode power and substrate bias voltages were deposited by pulsed DC reactive magnetron sputtering of a metallic Nb target in a pure oxygen atmosphere. The characteristics of the films have been studied using spectrometer, atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM). Laser damage tests at 1064 nm wavelength with pulse duration of 12 ns we re conducted on the single-layer systems. Results indicate that the cathode power may not be an im portant impact-factor of the LIDT of Nb