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Investigation of Low-Frequency Noise in High-k First/Metal Gate Last HfO 2 and ZrO 2 nMOSFETs
Investigation of Low-Frequency Noise in High-k First/Metal Gate Last HfO 2 and ZrO 2 nMOSFETs
2014
San-Lein Wu
Bo Chin Wang
Yu Ying Lu
Shih-Chang Tsai
Jone-Fang Chen
Shoou-Jinn Chang
Sheng-Po Chang
Che Hua Hsu
Chih-Wei Yang
Cheng-Guo Chen
Osbert Cheng
Po Chin Huang
Keywords:
Metal gate
High-κ dielectric
Electronic engineering
Electrical engineering
Engineering
Engineering physics
Infrasound
Correction
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