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Characteristics of AlN thin film prepared by biased reactive RF mangetron sputtering
Characteristics of AlN thin film prepared by biased reactive RF mangetron sputtering
1998
Shin Cheul Kim
Yong-Suk Roh
Ui Sik Kim
Kwangho Jeong
Keywords:
Thin film
Sputtering
Analytical chemistry
Materials science
Optoelectronics
Correction
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