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Characteristics of the Hf 0.5 Zr 0.5 O 2 Thin Films Grown by a Facing Target Sputtering Method
Characteristics of the Hf 0.5 Zr 0.5 O 2 Thin Films Grown by a Facing Target Sputtering Method
2019
Taiki Kawamoto
Hiroshi Ota
Yuichi Hirofuji
Kazuto Koike
Mitsuaki Yano
Sadao Kazukura
Yutaka Nakamitsu
Keywords:
Optoelectronics
Sputtering
Thin film
Materials science
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