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Plasma enhanced chemical vapor deposition of SiO2 using novel alkoxysilane precursors
Plasma enhanced chemical vapor deposition of SiO2 using novel alkoxysilane precursors
1995
K. H. A. Bogart
Nathan F. Dalleska
G. R. Bogart
Ellen R. Fisher
Keywords:
Hybrid physical-chemical vapor deposition
Plasma processing
Combustion chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Inductively coupled plasma
Infrared spectroscopy
Analytical chemistry
Chemistry
Inorganic chemistry
Refractive index
Correction
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