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Single Wafer Tool Cleaning for Bi-layer Photoresist Rework - Stripper Development and Evaluation
Single Wafer Tool Cleaning for Bi-layer Photoresist Rework - Stripper Development and Evaluation
2007
Aiping Wu
Eugene C. Baryschpolec
Les Molnar
Sally Ann Henry
Stefan Detterbeck
Ladislaus Brilz
Christin Bartsch
Georg Sulzer
Andreas Ott
Keywords:
Rework
Photoresist
Wafer
Manufacturing engineering
Materials science
bi layer
Mechanical engineering
Correction
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