ФОРМИРОВАНИЕ БЕЗДЕФЕКТНОЙ ПЛЕНКИ ЭЛЕКТРОЛИТА ТВЕРДООКСИДНОГО ТОПЛИВНОГО ЭЛЕМЕНТА МЕТОДОМ РЕАКТИВНОГО МАГНЕТРОННОГО РАСПЫЛЕНИЯ ZRY МИШЕНИ

YSZ (yttria stabilized zirconia) thin films were prepared by reactive magnetron sputtering PVD in Ar/O2 atmosphere onto the porous NiO/YSZ anode substrates at the temperature of 300 °C. The thickness of the coating was of 2-8 µm. The morphology and structural properties of the films were investigated depending on deposition conditions and methods of surface modification.