Implementation of chitosan and alginate as a transfer mask in lithography and transfer processes

The present invention relates to a lithography process and transfer comprising the following successive steps: a) a step of depositing at least one biopolymer on a substrate from an aqueous solution of said biopolymer, b) an exposure step to electromagnetic radiation or to an electron beam or ions localized areas of (es) biopolymer (s) deposited (s) in a pattern or series of patterns, c) a development step resulting in the elimination of (des) biopolymer (s) on the exposed areas, so as to obtain areas of non-coated biopolymer substrate (s) corresponding to said pattern or said plurality of patterns defined by a biopolymer mask (s), d) a step of transferring the pattern or series of patterns by etching, deposition and / or implantation on the areas of non-covered by the mask substrate biopolymer (s), e) a step of selectively removing biopolymer mask ( s) deposited (s) of the substrate (s) biopolymer (s) being selected (s) from chitosan and alginates.