Lithography till the end of Moore's law

Soon after the realization of Moore's law, the suspicion on this law reaching an end persisted. Now, the concern is as serious as it can get. Not only the feature size has to be scaled down, the manufacturing cost also has to be contained. This presentation covers the lithography tools and processes to sustain Moore's law of scaling and Moore's law of economy. It includes the three viable candidates to push lithography beyond the 20nm logic node. (1) Extension of immersion lithography beyond the optical resolution limit by multiple patterning. (2) Reduction of the ArF immersion wavelength by an order of magnitude to the 13.5 nm EUV wavelength. (3) Use of massive parallelism on e-beam direct write.