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High‐performance and Industrially Viable Nanostructured SiOx Layers for Interface Passivation in Thin Film Solar Cells
High‐performance and Industrially Viable Nanostructured SiOx Layers for Interface Passivation in Thin Film Solar Cells
2021
Jose M. V. Cunha
Kevin Oliveira
Jackson Lontchi
Tomás S. Lopes
M. A. Curado
João R. S. Barbosa
Carlos Vinhais
Wei-Chao Chen
Jérôme Borme
Hélder Fonseca
João Gaspar
Denis Flandre
Marika Edoff
A.G. Silva
J. P. Teixeira
Paulo Fernandes
Pedro M. P. Salome
Keywords:
Photolithography
Thin film solar cell
Passivation
Materials science
Optoelectronics
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