Coatings of Ti and TiO2 with Defined Roughness for Implants by Gas Flow Sputtering

High rate film deposition via Gas Flow Sputtering was used to develop both metallic titanium films and ceramic titania coatings for implants. The structure formation of the coatings can be described by a modified model of structure zones according to Thornton. The potential of Gas Flow Sputtering for designing implant surfaces with controlled morphology and roughness is demonstrated.