The growth of infrared antimonide-based semiconductor lasers by metal-organic chemical vapor deposition

We describe the metal-organic chemical vapor deposition (MOCVD) growth of InAsSb/InAs and GaAsSb/GaAs(P) multiple quantum well (MQW) and InAsSb/InAsP and InAsSb/InPSb strained-layer superlattice (SLS) active regions for use in mid-infrared emitters. We also describe the growth and initial characterization of GaAsSbN/GaAs MQW structures. By changing the layer thickness and composition of the InAsSb SLSs and MQWs, we have prepared structures with low temperature (<20 K) photoluminescence wavelengths ranging from 3.2 to 6.0μ m. We have made gain-guided, injection lasers using undoped, p-type AlAs0.16Sb0.84 for optical confinement and both strained InAsSb/InAs MQW and InAsSb/InAsP and InPSb SLS active regions. The lasers and LEDs utilize the semi-metal properties of a p-GaAsSb/n-InAs heterojunction as a source for electrons injected into the active regions. Cascaded, semi-metal, mid-infrared, injection lasers with pseudomorphic InAsSb multiple quantum well active region lasers and LEDs are reported. We also report on GaAsSb/GaAs(P) lasers and LEDs emitting at 1.1 to 1.2 μm grown on GaAs substrates and using AlGaAs layers for confinement.