Magnetic material sputtering target and a method of manufacturing the same

A magnetic material sputtering target, in a plane observing the oxides in the target, an oxide average particle diameter of the oxide particles present in the target is 1.5μm or less, observation of the oxide in the target in a plane, the minimum value of the distance between 2 straight lines oxides maximum distance between any two points on the outer periphery of the particles and maximum diameter, when sandwiching the same particles in a straight line parallel two outermost If it is a small diameter, the oxide particles difference between the maximum diameter and the minimum diameter is 0.4μm or less, the magnetic material sputtering target which is characterized in that accounts for 60% or more in the target observation plane. Obtain a non-magnetic material particle-dispersed magnetic material sputtering target which can suppress abnormal discharge oxides that cause the generation of particles during sputtering. .FIELD 1