A new design of the sputter type metal ion source and its characteristics of ion beam extraction

In an attempt to get a high current metal ion beam of various solid elements including refractory metals, a gaseous duoPIGatron ion source was modified by placing a grid type cathode and a sputter target in the PIG chamber. Tungsten mesh was adopted as the cathode grid, and Ar gas was used for a support gas for sputter induction. For Cu, Fe, and Al, the ion current and ratio of the metal ion were obtained for various conditions of sputtering voltage, support gas pressure, arc current, magnet current, and beam extraction voltage. Results showed that the metal current density linearly changes with the sputtering voltage and magnet current. The ratio of the metal ions in the total current is larger at lower support gas pressure. Current densities for Al, Cu, and Fe were 4 mA/cm/sup 2/, 5.5 mA/cm/sup 2/, and 2 mA/cm/sup 2/, respectively, at an arc current of 3 A, an extraction voltage of 20 kV, and a sputtering voltage of 1 kV. The ratios of the metals in the extracted ion currents were 9%, 8%, and 5% for Al, Cu, and Fe, respectively. >