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Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling
Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling
2017
Igor V. Fomenkov
David C. Brandt
Alex I. Ershov
Alexander Schafgans
Yezheng Tao
G. Vaschenko
Slava Rokitski
Michael Kats
Michael Vargas
Michael Purvis
Rob Rafac
Bruno La Fontaine
Silvia De Dea
Andrew LaForge
Jayson Stewart
Steven Chang
Matthew J. Graham
Daniel J. Riggs
Ted Taylor
Mathew Abraham
Daniel Brown
Keywords:
X-ray lithography
Laser power scaling
Immersion lithography
Next-generation lithography
Optoelectronics
Lithography
Multiple patterning
Extreme ultraviolet lithography
Materials science
high volume manufacturing
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