Optical scattering and microstructure of ion beam deposited metal coatings

Thin films of gold and platinum have been deposited onto super-polished fused silica substrates using thermal evaporation, ion assisted deposition (IAD), sputtering and ion assisted sputtering. The influence of ion beam flux, coating material and deposition rate on the films microroughness have been investigated. Coatings of gold and platinum have been bombarded with low energy (10-20 eV) Ar ions from an electron cyclotron resonance (ECR) ion source during deposition. Short range surface microroughness of coated surfaces has been examined using scanning tunneling microscopy (STM) and atomic force microscopy (AFM), while long range surface microroughness has been characterized using an angle resolved optical scatterometer. Results indicate that bombardment with low energy ions cause significant reduction in microroughness of metal coatings.