Gaussian beam writing strategy : Accuracy of using the Shape Beam simulator SELID for Gaussian Beam Systems

Obtaining highly aggressive resolution with E-Beam direct writing needs accurate simulation tools. SIGMA-C software SELID allows simulating patterns profiles transferred into a resist film in the case of a Shaped Beam system. However E-Beam tools that allow achieving very high resolution, especially for dense patterns, are Gaussian Beam systems. This article deals with the comparison of experimental lines obtained with a Gaussian Beam writing system and with simulation by SELID of such lines. A negative chemically amplified photo resist (NEB22, Sumitomo) was exposed by our Leica UHR 100 keV. By using a high beam step size with a Gaussian spot 5 nm of FWHM (Full Width at Half Maximum), we showed that Shaped Beam simulations obtained with SELID are accurate compared to experiments.