Ceramics inner coating of narrow tubes by a coaxial magnetron pulsed plasma

Abstract We have developed a double-ended anode coaxial magnetron pulsed plasma (DCMPP) for the purpose of coating fine ceramics with, for example, titanium nitride (TiN) on the inner surface of a narrow insulated tube by reactive sputtering. In the magnetron pulsed plasma, the magnetron effect and J × B plasma transport by a pulsed discharge occurred simultaneously. Discharge characteristics and optimum conditions for uniform and high-rate sputter-coating were investigated. By using DCMPP, goldcolored TiN films could be deposited on the inner surfaces of narrow glass tubes of 8 mm in inner diameter and 400 mm in length. The deposition rate was about 20 nm min −1 for a deposition time of 600 s. By using a light absorption method, it was found that axial uniformity of the prepared films was within 25% over 400 mm.