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Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
2013
Dina H. Triyoso
Klaus Hempel
S. Ohsiek
V. Jaschke
J. Shu
Sergej Mutas
Kornelia Dittmar
J.K. Schaeffer
Dirk Utess
Markus Lenski
Keywords:
Silicon nitride
High-κ dielectric
Gate oxide
Analytical chemistry
Inorganic chemistry
Chemistry
Optoelectronics
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