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Formation of Ge/GeSiSn heterostructure by sputter epitaxy method
Formation of Ge/GeSiSn heterostructure by sputter epitaxy method
2020
Takahiro Tsukamoto
Nobumitsu Hirose
Akifumi Kasamatsu
Toshiaki Matsui
Yoshiyuki Suda
Keywords:
Materials science
Epitaxy
Sputtering
Optoelectronics
Crystal growth
Heterojunction
Correction
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