Characterization of a liquid-xenon-jet laser-plasma extreme-ultraviolet source

Björn A. M. Hansson,O. Hemberg,Hans M. Hertz,Magnus Berglund,Hee-June Choi,Björn Jacobsson,Emmanuelle Janin,Sofia Mosesson,Lars Rymell,Jalmar Thoresen,Martin Wilner

Characterization of a liquid-xenon-jet laser-plasma extreme-ultraviolet source

2004

Björn A. M. Hansson
O. Hemberg
Hans M. Hertz
Magnus Berglund
Hee-June Choi
Björn Jacobsson
Emmanuelle Janin
Sofia Mosesson
Lars Rymell
Jalmar Thoresen
Martin Wilner

A liquid-xenon-jet laser-plasma source for extreme-ultraviolet (EUV) and soft-x-ray generation has been characterized. Being a source candidate for EUV lithography (EUVL), we especially focus on pa ...

Keywords:

Extreme ultraviolet
Xenon
Plasma
Laser
Ultraviolet
Optics
Extreme ultraviolet lithography
Physics
Silicon
Optoelectronics
Molybdenum

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