Polishing method of the metal-polishing liquid and the film to be polished

(A) the occurrence of scratches resulting from solid particles, (b) dishing generation of flatness deterioration of erosion such as the complexity of the cleaning step for removing abrasive particles remaining in (c) the substrate surface after polishing , (d) is a polishing method of solid abrasive grains solve the problem in cost, etc. due to cost and waste treatment itself and, and high Cu polishing CMP metal capable polishing rate liquid and the film to be polished using the same provide. Metal oxidizing agents, metal oxide dissolving agent, a metal anticorrosive, and a weight average molecular weight of a water-soluble polymer having a 8000 or more anionic functional groups, a metal-polishing liquid and the polishing platen a pH of 1 to 3 while supplying the metal-polishing liquid onto the polishing cloth, the characterized by grinding relatively moving a polishing platen and the substrate while pressing the substrate to the polishing cloth with a metal to be polished film polishing method of polishing film.