A method of applying textured YSZ layers by sputter-coating

The invention relates to a method for depositing texturized oxidic layers on a substrate (33) through cathodic sputtering in a receptacle (12) filled with process gas (15) containing oxygen. According to said method, an electrical voltage (U) is applied to a target (20) in the receptacle. A gas discharge is ignited, thereby forming a plasma containing particles . The receptacle is emptied until an appropriate pressure is obtained and the substrate and the target are arranged at a given angle ( alpha ) to each other so that a particle beam (I) made from plasma particles hits the substrate at a given angle. According to the invention, a metal target (2) is used and the target particles released therefrom are oxidized to form an oxide so that specially high-quality texturized oxidic layers can be deposited even on large surfaces.