Advanced mask aligner lithography (AMALITH)
2013
In this paper we show that it is possible using optical photolithography to obtain micron and submicron features for
periodic structures in non-contact using the Talbot effect. In order for this effect to work it is important to have good
control of the illumination light and here we show that the MO Exposure Optics (MOEO) developed by SUSS
MicroOptics provides uniform and well collimated illumination light suitable for Talbot lithography. The MOEO can
easily be incorporated into a standard mask aligner. Here we show 1μm and 0.65μm diameter holes in a hexagonal array
in photoresist made in large-gap proximity printing.
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