Эллипсометрический контроль толщины пленок карбида кремния на полиметилметакрилатной основе

By experimental measurements caused by ion-plasma sputtering of thin films of SiC has been shown that the ellipsometric measurement ofparameters of thin films are accurate and reliable method of control of technological process ofmanufacturing of complex composite coatings, so you can choose the time of coating to obtain a desired thickness.