Old Web
English
Sign In
Acemap
>
Paper
>
Tantalum-based Gate Electrode Metals for Advanced CMOS Applications
Tantalum-based Gate Electrode Metals for Advanced CMOS Applications
2006
Jacob Hooker
R.J.P. Lander
F.N. Cubaynes
Tom Schram
F. Roozeboom
Jeroen van Zijl
M. Maas
Eric van den Heuvel
Emile Naburgh
J. G. M. van Berkum
Y. Tamming
T. Dao
Kirklen Henson
Marc Schaekers
Annemie Van Ammel
Zsolt Tokei
Marc Demand
C.J.J. Dachs
Keywords:
Electrode
Electronic engineering
CMOS
Tantalum
Materials science
Optoelectronics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]