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HfO2-based solid solutions for high-k/metal gate stack properties improvement
HfO2-based solid solutions for high-k/metal gate stack properties improvement
2008
C. Dubourdieu
Virginie Brizé
J. Ubrig
S. Margueron
I. Matko
Erwan Rauwel
F. Ducroquet
Nevine Rochat
Andreas Klein
B. Hollander
Keywords:
High-κ dielectric
Metal gate
Electronic engineering
Solid solution
Materials science
Optoelectronics
Correction
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