Microstructure and physical properties of BxNy(OzHk) coatings deposited by r.f. unbalanced magnetron sputtering

Abstract Thin films of boron nitride are produced by means of r.f. unbalanced magnetron sputtering using a pyrolytic boron nitride target. Different sputtering parameters such as target-to-sample distance, magnetic field and total discharge pressure are investigated. The study of the film microstructure is performed by means of FT-IR and by glancing angle X-ray diffraction. The film stoichiometry is determined by using nuclear techniques such as Rutherford back-scattering spectrometry, elastic recoil detection, (p, α ) and (d,p) nuclear reactions. The collected data are discussed and related to the film microstructure by structural modelling.