Novel fabrication technique of TiNi shape memory alloy film using separate Ti and Ni targets

Abstract This paper proposes a novel fabrication technique of TiNi shape memory alloy (SMA) film and verifies the validity by showing the actual fabrication process and the final results. Special attention is paid to the characterization of differential scanning calorimetry (DSC). An essential part of the fabrication process is the co-sputtering from separate pure Ti and Ni targets. Co-sputtering is carried out using a multi-target sputtering system where RF power for each target can be controlled independently. As-sputtered film is vacuum-annealed. The phase transformation behavior of the fabricated film is investigated by DSC and temperature-controlled X-ray diffractometry (XRD). Finally, shape recovery behavior is observed. The proposed novel fabrication technique is validated by these results.