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Channel Strain Characterization in Embedded SiGe by Nano-beam Diffraction
Channel Strain Characterization in Embedded SiGe by Nano-beam Diffraction
2008
Jinghong Li
Angela Lamberti
Anthony G. Domenicucci
L. Gignac
Henry K. Utomo
Zhijiong Luo
Nivo Rovedo
Sunfei Fang
Hung Ng
Judson R. Holt
Anita Madan
Chung Woh Lai
Ja-Hum Ku
Dominic J. Schepis
Jin-Ping Han
Mark Lagus
Keywords:
Nano-
Diffraction
Beam (structure)
Analytical chemistry
Strain (chemistry)
Communication channel
Materials science
Optoelectronics
Correction
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