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Physical Properties of Tantalum Pentoxide Thin Film Fbricated by RF-Magnetron Sputtering Method
Physical Properties of Tantalum Pentoxide Thin Film Fbricated by RF-Magnetron Sputtering Method
1997
Tomosumi Kamimura
Hazime Kanou
Kanyoshi Ochi
Kunio Yoshida
H. Yoshida
Hisanori Fujita
Shigeharu Tamura
Fumio Tani
Michio Sunagawa
Keywords:
Sputter deposition
Thin film
Analytical chemistry
Tantalum pentoxide
Chemistry
Optoelectronics
Correction
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