Cathodic arc deposition of diamond-like carbon : effect of bias voltage and deposition angle

Abstract The highly ionized, atomic particle flux of a cathodic arc discharge was applied to the fast rate deposition of carbon coatings at bias voltages fom 0 to −400 V and at deposition angles of 0°, 30° and 60°. The structure of the coating material grown directly from the ion flux was investigated by electron diffraction and by electron energy loss spectroscopy. The plasmon spectrum of the generally amorphous and sp 3 -dominated atomic arrangement showed a significant dependence upon the deposition parameters. The most diamond-like structure was found with a bias voltage of −50 to −100 V and at a deposition angle of 0°.