Effects of Ar Pressure and Sputtering Power on the Electrical and Surface Morphology of Mo Films Prepared by Magnetron Sputtering

The morphology and conductivity of Mo films are prepared under different working pressure(0.2-2.0 Pa) and power(50-150 W)on the ordinary glass substrates by direct current magnetron sputtering.The experimental result shows that the surface morphology becomes coarse with increaded Ar pressure when power is fixed at 108W.And the conductivity becomes worse correspondingly.The highest resistivity,1.22×10-4 Ω·cm,is reached at a Ar pressure of 0.4 Pa.When working pressure is fixed at 0.2 Pa,the deposition rate of Mo films increases almost linearly with power.And the surface morphology of Mo film becomes smoother with power increasing.In addition,the resistivity becomes lower with increased power and the lowest resistivity of Mo film is obtained as 7.6x10-5 Ω·cm at 148 W.