Enhanced p-Type Doping in Polycrystalline CdTe Films: Deposition and Activation

An in situ nonequilibrium method to increase hole density in polycrystalline CdTe thin films to 10 16 cm −3 using group V substitution on Te is presented. Single-phase CdTe films doped with P, As, and Sb were deposited at 550 °C at 100–200 nm/s onto moving cadmium sulfide/high resistance transparent buffer layer/transparent conductive oxide /glass superstrates by vapor transport deposition in Cd overpressure from high purity compound sources. Doping levels before and after activation were determined by capacitance-voltage analysis of diagnostic devices. Secondary ion mass spectrometry depth profiling confirmed dopant incorporation levels of 10 17 –10 18 atoms/cm 3 in as-deposited films. Electronic activation was carried out by post-deposition annealing in Cd or CdCl 2 vapor with fast cooling, increasing acceptor concentrations to >10 15 cm −3 for P and >10 16 cm −3 for As and Sb, compared with mid −10 14 cm −3 acceptor levels for undoped CdTe films. The activation methods are compatible with post-deposition processing presently used for high-efficiency CdTe solar cells. For the dopants As and Sb, the acceptor concentration increased by substitutional As Te and Sb Te formation, respectively, which was validated by cathodoluminescence spectroscopy.