Old Web
English
Sign In
Acemap
>
Paper
>
High quality silicon dioxide by low temperature neutral beam enhanced atomic layer deposition
High quality silicon dioxide by low temperature neutral beam enhanced atomic layer deposition
2019
HuaHsuan Chen
Daisuke Ohori
Takuya Ozaki
Mitsuya Utsuno
Tomohiro Kubota
Toshihisa Nozawa
Seiji Samukawa
Keywords:
Atomic layer deposition
Silicon dioxide
Optoelectronics
Beam (structure)
Materials science
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]