Bipolar technology for 0.5-micron-wide base transistor with an ECL gate delay of 21.5 picoseconds
1992
This paper presents a high speed Si bipolar transistor using polysilicon sidewall base-electrode transistor (POSET) technology developed from self-aligned silicon bipolar transistor technology. We reduced the parasitic capacitance between the base and the collector to a minimum to maximize the transistor's speed. Other techniques were used to make a practical device with a gate delay time of 21.5 ps/gate at a switching current of 0.32 mA. This is faster than any commercial bipolar transistor at a switching current about one third. >
Keywords:
- Multiple-emitter transistor
- Bipolar transistor biasing
- Field-effect transistor
- Physics
- Bipolar junction transistor
- Electrical engineering
- Heterostructure-emitter bipolar transistor
- Electronic engineering
- Current injection technique
- Darlington transistor
- Insulated-gate bipolar transistor
- Transistor
- Optoelectronics
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