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Effect of Pressure on InAlN Films Grown by MOCVD for HEMT Application
Effect of Pressure on InAlN Films Grown by MOCVD for HEMT Application
2013
Wei-Ching Huang
Kusan-Shin Liu
Yuen-Yee Wong
Chi-Feng Hsieh
Edward Yi Chang
Keywords:
Metalorganic vapour phase epitaxy
Speech recognition
Analytical chemistry
High-electron-mobility transistor
Materials science
Optoelectronics
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