High precision positioning of plasmonic nanoparticle based on damascene process
2012
Nanoparticle positioning by a silicon pore array template with decreasing pore diameter down to 16 nm opens up a new way of fabrication of metal nanostructures based on high precision dry etching of silicon. We demonstrate how this process can be used to fabricate plasmonic nano-structures. Plasmonic dipole structures are presented with variable gap size below 20 nm.
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