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Influence of heavier impurity deposition on Cr sputtering under He plasma exposure in multiple linear plasma devices
Influence of heavier impurity deposition on Cr sputtering under He plasma exposure in multiple linear plasma devices
2018
D. Nishijima
A. Eksaeva
M.J. Baldwin
R.P. Doerner
M. Miyamoto
A. Terra
Shin Kajita
D. Borodin
A. Kreter
N. Ohno
Dogyun Hwangbo
T. Schlummer
A. Pospieszczyk
M. Rasinski
Keywords:
Sputtering
Radiochemistry
Plasma
Impurity
Materials science
plasma exposure
Deposition (law)
Analytical chemistry
Correction
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