Effects of element chemical states and grain orientation growth of ITO targets on photoelectric properties of the film

Abstract A study was carried out to compare element chemical states and grain orientation growth between two ITO targets, which were respectively sintered at 1560 °C (target A#) and 1600 °C (target B#). The lower sintering temperature can be beneficial to increase mass content ratio of In 2 O 3 to SnO 2 , reduce the production of Sn 2+ ions and the component of O-In as well as increase oxygen holes, and can also promote grain orientation growth of In 2 O 3 and In 4 Sn 3 O 12 phase. Three groups of ITO films were deposited at 230 °C using these targets to investigate the effects of sputtering parameters on the photoelectric properties of ITO films. Under different sputtering pressures, the sheet resistance for target A# has higher sensitivity to low O 2 flow, while target B# displays higher sensitivity to high O 2 flow. In the case of sputtering pressure of 0.5 Pa, ITO films for target A# displays the highest visible transmittance. In addition, annealing process could decrease the sheet resistance and improve the transmittance of ITO films because of its effect on the crystallinity and surface morphology of ITO films.